| AVS 50th International Symposium | |
| Advanced Surface Engineering | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | SE-MoA1 High-resolution TEM Study the Microstructure of W-Si-C Films in the Vicinity of the Crystalline-Amorphous Transition J.E. Krzanowski, J. Wormwood, University of New Hampshire |
| 2:20pm | SE-MoA2 Metrology of 1-10 nm Thick CNx Films: Thickness, Density and Surface Roughness Measurements D.J. Li, Northwestern University,Tianjin Normal University, Y. Chen, Y.W. Chung, Northwestern University |
| 2:40pm | SE-MoA3 Invited Paper Reactive Magnetron Sputtering of Hard Si-C-N and Si-B-C-N Films and Their Properties J. Vlcek, J. Cizek, S. Potocky, M. Kormunda, J. Houska, P. Zeman, Z. Soukup, University of West Bohemia, Czech Republic |
| 3:20pm | SE-MoA5 Using NMR to Probe the Bonding in Amorphous Carbon Nitride Thin Films W.J. Gammon, College of William & Mary, O. Kraft, Inst. fur Materialforschung II, Germany, G.L. Hoatson, A.C. Reilly, B.C. Holloway, College of William & Mary |
| 3:40pm | SE-MoA6 DLC and CNx Coatings Produced by Pulsed Laser and Filtered Vacuum Arc Techniques A.A. Voevodin, J.G. Jones, T.C. Back, J.S. Zabinski, Air Force Research Laboratory, V.E. Strelnitzki, I.I. Aksenov, Kharkov Physical Technical Institute, Ukraine |
| 4:00pm | SE-MoA7 Fabrication and Properties of Ultra-nano, Nano, and Polycrystalline Diamond Membranes and Sheets D.K. Reinhard, Michigan State University and Fraunhofer Center for Coating and Laser Applications, M. Becker, Fraunhofer Center for Coating and Laser Applications, R.A. Booth, Michigan State University and Fraunhofer Center for Coating and Laser Applications, T.P. Hoepfner, Michigan State University, T.A. Grotjohn, J. Asmussen, Michigan State University and Fraunhofer Center for Coating and Laser Applications |
| 4:20pm | SE-MoA8 Nanotribological Properties of Nanocomposite and Amorphous CrBN Thin Films D.M. Mihut, J. Turner, T.P. Butler, University of Nebraska, Lincoln, S.M. Aouadi, Southern Illinois University, S.L. Rohde, University of Nebraska, Lincoln |