AVS 50th International Symposium | |
Applied Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | AS-ThM1 Invited Paper Role of Vacuum Technology and Other Drivers in the Development of Surface Analysis C.J. Powell, National Institute of Standards and Technology |
9:00am | AS-ThM3 Valence-band X-ray Photoelectron Spectroscopic Studies of Phosphorus Oxides and Phosphates K.J. Gaskell, M.M. Smith, P.M.A. Sherwood, Kansas State University |
9:20am | AS-ThM4 Application of Electron Based Spectroscopies Combined with Chemical Derivatization for the Characterization of Black Carbon Surfaces L.A. Langley, T.H. Nguyen, W.P. Ball, D.H. Fairbrother, Johns Hopkins University |
9:40am | AS-ThM5 Comparison of X-ray and Electron Beam Induced Damage Rates A.S. Lea, M.H. Engelhard, D.R. Baer, Pacific Northwest National Laboratory |
10:00am | AS-ThM6 Charge Referencing in XPS Analysis of Self-assembled Nano-phase Particle (SNAP) Surface Treatments L.S. Kasten, University of Dayton Research Institute, V.N. Balbyshev, Universal Technology Corporation, M.S. Donley, Air Force Research Laboratory (AFRL/MLBT) |
10:20am | AS-ThM7 Quantitative Depth Profiling of Silicon Oxynitride Films by Electron Spectroscopy P. Mrozek, D.F. Allgeyer, B. Carlson, Micron Technology Inc. |
10:40am | AS-ThM8 Characterization of Silicon-Oxynitride Dielectric Thin Films using Grazing Incidence X-Ray Photoelectron Spectroscopy E. Landree, T. Jach, National Institute of Standards and Technology |
11:00am | AS-ThM9 XPS Study of Ultrathin Ferroelectric Films L. Vanzetti, M. Bersani, M. Barozzi, M. Anderle, ITC-irst, Italy, V. Nagarajan, T. Zhao, R. Ramesh, University of Maryland |
11:20am | AS-ThM10 Auger Spectra Line Shape Study in Iron-Aluminum-Oxygen Reaction System S. Nayak, University of Tennessee, Knoxville, H.M. Meyer, III, Oak Ridge National Laboratory, N.B. Dahotre, University of Tennessee, Knoxville |
11:40am | AS-ThM11 The Dispersion of Quantum Well States in Cu/Co/Cu(001) Y.Z. Wu, C. Won, University of California, Berkeley, E. Rotenberg, Lawrence Berkeley National Laboratory, H.W. Zhao, University of California, Berkeley, N.V. Smith, Lawrence Berkeley National Laboratory, Z.Q. Qiu, University of California, Berkeley |