| AVS 49th International Symposium | |
| Thin Films | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-WeA1 Influence of Film Roughness on the Electrical Properties of W / Al@sub 2@O@sub 3@ Films Grown on Si(100) by Atomic Layer Deposition F.H. Fabreguette, M.D. Groner, Z.A. Sechrist, S.M. George, University of Colorado |
| 2:20pm | TF-WeA2 Growth and Structure of Al@sub 2@O@sub 3@/W Nanolaminates Fabricated Using Atomic Layer Deposition Techniques Z.A. Sechrist, F.H. Fabreguette, University of Colorado, O. Heintz, Universite de Bourgogne, S.M. George, University of Colorado |
| 2:40pm | TF-WeA3 Examination of New ALD Processes for Microelectronics M. Ritala, K. Kukli, T. Aaltonen, P. Alen, M. Vehkamäki, T. Hänninen, T. Hatanpää, R. Matero, A. Niskanen, A. Rahtu, V. Pore, M. Leskelä, University of Helsinki, Finland |
| 3:00pm | TF-WeA4 Temperature Effects during Quartz-crystal Microbalance Measurements of Thin Film Growth during Atomic Layer Deposition M.N. Rocklein, S.M. George, University of Colorado, Boulder |
| 3:20pm | TF-WeA5 Atomic Layer Deposition of Tribological Coatings for MEMS Devices T.M. Mayer, P.G. Kotula, R.S. Goeke, Sandia National Laboratories, J.W. Elam, S.M. George, University of Colorado |
| 3:40pm | TF-WeA6 Conformal Coating of Ultrahigh Aspect Ratio Anodic Alumina Membranes by Atomic Layer Deposition J.W. Elam, University of Colorado, D. Routkevitch, P.P. Mardilovich, Nanomaterials Research Corporation, S.M. George, University of Colorado |
| 4:00pm | TF-WeA7 Low Temperature Al@sub 2@O@sub 3@ Atomic Layer Deposition M.D. Groner, F.H. Faberguette, J.W. Elam, S.M. George, University of Colorado at Boulder |
| 4:20pm | TF-WeA8 Theoretical and Experimental Investigation of Atomic Layer Deposition of Copper(I) Oxide T. Törndahl, M. Ottosson, K.M.E. Larsson, J.-O. Carlsson, Uppsala University, Sweden |