AVS 49th International Symposium | |
Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | SS-ThM1 Electronic Structure of Atomic Chains on Vicinal Silicon J.N. Crain, University of Wisconsin - Madison, K.N. Altmann, Synchrotron Radiation Center, Ch. Bromberger, Philipps - University, Germany, A. Kirakosian, J.-L. Lin, J.L. McChesney, F.J. Himpsel, University of Wisconsin - Madison |
8:40am | SS-ThM2 Origin of the Negative Shift Observed in the XPS Spectra of Cu and Ag Cations having d@super 10@ Electronic Configuration D.A. Kukuruznyak, J.G. Moyer, A.L. Ankudinov, J.J. Rehr, F.S. Ohuchi, University of Washington |
9:20am | SS-ThM4 Electronic Band Structure of Sn/Si(111) J. Lobo, A. Tejeda, Universidad Autonoma de Madrid, Spain, A. Mugarza, Universidad del Pa@aa e@s Vasco, Spain, E.G. Michel, Universidad Autonoma de Madrid, Spain |
9:40am | SS-ThM5 Invited Paper Electron Confinement in Metallic Ultrathin Films Z.Q. Qiu, University of California at Berkeley |
10:20am | SS-ThM7 Dominance of the Final State in Photoemission Mapping of the Fermi Surface of Co Thin Films R.L. Kurtz, X. Gao, Louisiana State University, A.N. Koveshnikov, Simon Fraser University, Canada, R.L. Stockbauer, Louisiana State University |
10:40am | SS-ThM8 Spin-Resolved Photoemission of Surface States in H on W(110) E. Rotenberg, Lawrence Berkeley National Laboratory, M. Hochstrasser, J.G. Tobin, Lawrence Livermore National Laboratory, S.D. Kevan, University of Oregon |
11:00am | SS-ThM9 Ultraviolet Laser Interactions with Single Crystal Sodium Nitrate: Wavelength Dependence of Photodesorbed Products L. Cramer, J.T. Dickinson, Washington State University, W.P. Hess, Pacific Northwest National Laboratory |
11:20am | SS-ThM10 Low Dimensional Metallic States in Heavily Irradiated CaF@sub 2@ Thin Films on Si(111) A.A. Bostwick, J.A. Adams, A. Klust, University of Washington, E. Rotenberg, Advanced Light Source, M.A. Olmstead, University of Washington |
11:40am | SS-ThM11 Ion Emission from Ultrathin Resists during Exposure to Metastable Atom Beams Y. Yamauchi, X. Ju, T. Suzuki, M. Kurahashi, National Institute for Materials Science, Japan |