| AVS 49th International Symposium | |
| Plasma Science | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-TuM1 Instabilities in a Dielectric Barrier Discharge at Atmospheric Pressure M.C.M. Van de Sanden, E. Aldea, Eindhoven University of Technology, The Netherlands, C.P.G. Schrauwen, TNO TPD, The Netherlands |
| 8:40am | PS-TuM2 Invited Paper Atmospheric Pressure Plasma Processing R.F. Hicks, G.R. Nowling, M. Moravej, X. Yang, University of California, Los Angeles, G. Ding, Applied Materials, S.E. Babayan, Surfx Technologies LLC |
| 9:20am | PS-TuM4 Atmospheric Pressure Plasma Treatment of Polypropylene@footnote 1@ R. Dorai, M.J. Kushner, University of Illinois at Urbana-Champaign |
| 9:40am | PS-TuM5 Simulation of the Plasma Dynamics and Chemical Phenomena in Dielectric-barrier Controlled Atmospheric-pressure Glow Discharges X. Yuan, L. Raja, University of Texas at Austin |
| 10:00am | PS-TuM6 Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure M. Moravej, S. Babayan, G.R. Nowling, X. Yang, R.F. Hicks, University of California, Los Angeles |
| 10:20am | PS-TuM7 Invited Paper Low Energy Electron Enhanced Etching (LE4) for Reduced Process Damage in Compound Semiconductor Devices H.P. Gillis, S.H. Lee, University of California, Los Angeles, D.I. Margolese, S.J. Anz, Systine, Inc. |
| 11:00am | PS-TuM9 Coulomb Crystals in Plasma Processing Reactors@footnote 1@ V. Vyas, M.J. Kushner, University of Illinois at Urbana-Champaign |
| 11:20am | PS-TuM10 Simplified Model for Calculating the Pressure Dependence of a DC Planar Magnetron Discharge and Experimental Verification G. Buyle, D. Depla, K. Eufinger, Ghent University, Belgium, W. De Bosscher, Bekaert Advanced Coatings, Belgium, J. Haemers, R. De Gryse, Ghent University, Belgium |
| 11:40am | PS-TuM11 Conformal and Anisotorpic Deposition of Cu Films using H-assisted Plasma CVD M. Shiratani, K. Takenaka, M. Onishi, K. Koga, Y. Watanabe, Kyushu University, Japan, T. Shingen, Asahi Denka Kogyo K.K., Japan |