| AVS 49th International Symposium | |
| Plasma Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-MoM1 Invited Paper The Evolution of Plasma Etching in Integrated Circuit Manufacturing J.W. Coburn, University of California, Berkeley |
| 9:00am | PS-MoM3 Resist Transformation under High Density Plasma Exposure E. Pargon, J. Foucher, J. Detter, L. Vallier, G. Cunge, O. Joubert, CNRS/LTM, France, Th. Lill, Applied Materials |
| 9:20am | PS-MoM4 A Novel Gate-Electrode Fabricating Technique using a Sequential UHF-ECR Plasma Process M. Mori, Hitachi, Ltd.,Japan, T. Tsutsumi, Hitachi High-Technologies Corp.,Japan, N. Itabashi, M. Izawa, Hitachi, Ltd.,Japan |
| 9:40am | PS-MoM5 Impact of Chemistry and Mask Nature on Critical Dimension Control of Gate Etch Processes X. Detter, STMicroelectronics, France, G. Cunge, E. Pargon, L. Vallier, O. Joubert, CNRS/LTM, France, R. Palla, I. Thomas-Boutherin, STMicroelectronics, France |
| 10:00am | PS-MoM6 Deposition of Silicon Oxychloride Films on Chamber Walls during Cl@sub 2@/O@sub 2@ Plasma Etching of Si S.J. Ullal, H. Singh, V. Vahedi, Lam Research Corporation, E.S. Aydil, University of California, Santa Barbara |
| 10:20am | PS-MoM7 HBr Outgassing and Condensation from Silicon and Polysilicon Wafers after Plasma Etching H. Singh, D. Outka, J.D. Daugherty, Lam Research Corporation |
| 10:40am | PS-MoM8 Energetic Neutral Fluxes Towards Surfaces in a MERIE Like Reactor W. Sabisch, M. Kratzer, Infineon Technologies AG, Germany, R.P. Brinkmann, Ruhr University Bochum, Germany |
| 11:00am | PS-MoM9 ICP Etching of Poly-crystalline Si-Ge as a Gate Material K.M. Tan, W.J. Yoo, W.K. Choi, Y.H. Wu, J.H. Chen, D. Chan, National University of Singapore |
| 11:20am | PS-MoM10 Endpoint Strategies for Recess Etch Processes in DRAM and eDRAM Applications J.P. Merceron, Ecole Polytechnique, France, V.C. Venugopal, A.J. Perry, A.J. Miller, Lam Research Corporation |
| 11:40am | PS-MoM11 Numerical Model of a Cl@sub 2@-BCl@sub 3@ Metal Etch Reactor G.I. Font, W.L. Morgan, Kinema Research |