| AVS 49th International Symposium | |
| Plasma Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS+TF-ThM1 The Correlations between Gas Phase Chemistry, Material Properties, and Device Characteristics of PECVD ZrO@sub 2@ Thin Films B. Cho, J.P. Chang, University of California, Los Angeles |
| 8:40am | PS+TF-ThM2 Low-Temperature Plasma Migration Enhanced Epitaxy of CuInSe@sub 2@ on GaAs B.J. Stanbery, S. Kincal, S. Kim, T.J. Anderson, O.D. Crisalle, University of Florida |
| 9:00am | PS+TF-ThM3 2-Dimensional Plasma Simulation of Reactive Physical Vapor Deposition of Metal Nitride D. Zhang, S. Samavedam, J. Schaeffer, R. Martin, P.L.G. Ventzek, P. Tobin, Motorola Inc. |
| 9:20am | PS+TF-ThM4 Expanding Thermal Plasma for SiO@sub 2@ Films: A Chemistry-controlled Process and an Insight into the Deposition Mechanism M. Creatore, M. Kilic, K. O'Brien, M.C.M. Van de Sanden, Eindhoven University of Technology, The Netherlands |
| 9:40am | PS+TF-ThM5 Invited Paper Plasma Production of Silicon Clusters and Nanocrystalline Silicon Particles : A New Route for Nanostructured Silicon Thin Films P. Roca i Cabarrocas, Ecole Polytechnique, France |
| 10:20am | PS+TF-ThM7 Correlation between Cluster Amount and Qualities of a-Si:H Films for SiH@sub 4@ Plasma CVD K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Kyushu University, Japan |
| 10:40am | PS+TF-ThM8 Plasma and In Situ Film Diagnostic Study of Amorphous and Microcrystalline Silicon Deposition W.M.M. Kessels, J.P.M. Hoefnagels, Y. Barrell, P.J. Van den Oever, M.C.M. Van de Sanden, Eindhoven University of Technology, The Netherlands |
| 11:00am | PS+TF-ThM9 Mechanism of Hydrogen-Induced Crystallization of Amorphous Silicon Thin Films S. Sriraman, E.S. Aydil, D. Maroudas, University of California, Santa Barbara |
| 11:20am | PS+TF-ThM10 On the Roughness Evolution during Remote PECVD of Amorphous Silicon M.C.M. Van de Sanden, A.H.M. Smets, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 11:40am | PS+TF-ThM11 Detailed Study of Chemistry of Ar/C@sub 2@H@sub 2@ Plasma and Consequences For the a-C:H Film Growth J. Benedikt, R.V. Woen, M.C.M. Van de Sanden, Eindhoven University of Technology, The Netherlands |