| AVS 49th International Symposium | |
| Applied Surface Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | AS-MoA1 Invited Paper Toward a Comprehensive Quantitative Workbench for Surface Analysis R.A. Weller, Vanderbilt University |
| 2:40pm | AS-MoA3 Quantitative XPS and the Morphology Problem : Simple Algorithm for the Amount of Substance at the Surface S. Tougaard, University of Southern Denmark |
| 3:00pm | AS-MoA4 The Information Depth and the Mean Escape Depth in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy A. Jablonski, Polish Academy of Sciences, Poland, C.J. Powell, National Institute of Standards and Technology |
| 3:20pm | AS-MoA5 Wavelets: A New Technique for Spectral Processing in Surface Science - Applications to Filtering and Deconvoluting HREELS and XPS Data C. Charles, J.P. Rasson, G. Leclerc, P. Louette, J.J. Pireaux, Facultés Universitaires Notre-Dame de la Paix, Belgium |
| 3:40pm | AS-MoA6 Ultra Thin SiO@sub 2@ on Si: Quantification of the Oxide Thickness and Carbonaceous Contamination M.P. Seah, S.J. Spencer, National Physical Laboratory, UK |
| 4:00pm | AS-MoA7 Correcting for Detector-Induced Non Linearity in Photoelectron Spectroscopy Counting Systems C.S. Fadley, N. Mannella, S. Marchesini, University of California at Davis, A. Kay, Intel Corporation, S.-H. Yang, IBM Almaden Research Center, S. Mun, Intel Corporation, M.A. van Hove, Lawrence Berkeley National Laboratory |
| 4:20pm | AS-MoA8 Theoretical Foundations of Surface Stress Measurements using Atomic Force Microscope Cantilevers J.E. Sader, The University of Melbourne, Australia |
| 4:40pm | AS-MoA9 Elementary and Structure Analysis of Si Wafers and Thin Films by Using an X-ray Waveguide-Resonator V.K. Egorov, E.V. Egorov, Russian Academy of Science (IPMT RAS), Russia |