AVS 49th International Symposium
    Plasma Science Wednesday Sessions
       Session PS-WeM

Paper PS-WeM6
Residual-Free Reactive Ion Etching of the Bell Contact Ti/Pt/Au

Wednesday, November 6, 2002, 10:00 am, Room C-105

Session: Conductor Etch II
Presenter: G.F. Franz, University of Applied Sciences, Germany
Authors: G.F. Franz, University of Applied Sciences, Germany
R. Kachel, University of Applied Sciences, Germany
S. Sotier, University of Applied Sciences, Germany
Correspondent: Click to Email
The etching of the complete Bell contact consisting of a layer of Ti/Pt/Au was performed in highly reactive plasmas containing Cl@sub2@ for Ti, PF3@sub3@/NF@sub3@ for Pt, and Cl@sub2@ and/or BCl@sub3@ for Au. All the constituents of the Bell contact form volatile compounds in either capacitively-coupled low-density plasmas or high-density plasmas generated by electron cyclotron resonance. This is a conditio sine qua non for surfaces and sidewalls which have to remain free of any residues. Its functionality was demonstrated as self-adjusting mask for a surface-emitting laser.