AVS 49th International Symposium
    Plasma Science Wednesday Sessions
       Session PS+TF-WeP

Paper PS+TF-WeP5
Evaluation of PFC Emission Reduction for PE-CVD Chamber Cleaning with Measurement and Simulation

Wednesday, November 6, 2002, 11:00 am, Room Exhibit Hall B2

Session: Plasma Etching & Deposition
Presenter: E. Wani, Research Institute of Innovative Technology for the Earth (RITE), Japan
Authors: E. Wani, Research Institute of Innovative Technology for the Earth (RITE), Japan
K. Kosano, Research Institute of Innovative Technology for the Earth (RITE), Japan
T. Sunada, Research Institute of Innovative Technology for the Earth (RITE), Japan
S. Okura, Research Institute of Innovative Technology for the Earth (RITE), Japan
Y. Mitsui, Research Institute of Innovative Technology for the Earth (RITE), Japan
K. Sakai, Research Institute of Innovative Technology for the Earth (RITE), Japan
T. Beppu, Research Institute of Innovative Technology for the Earth (RITE), Japan
A. Sekiya, National Institute of Advanced Industrial Science and Technology (AIST), Japan
Correspondent: Click to Email
The reduction of perfluorocarbons and other fluorinated compounds (PFCs) emission from PE-CVD chamber cleaning is one of the urgently required issues in the semiconductor manufacturing for the prevention of global warming. There are mainly three approaches such as the optimization of traditional cleaning processes, the development of alternative gases and the development of alternative cleaning processes. In our recent study, COF@sub 2@ has been suggested as a potential alternative cleaning gas.@footnote 1@ Various methods for the emission reduction have been investigated from the aspects of the alternative gas, process and tools. The process condition optimization is a common requirement to induce best performance for all these investigations. Recently, a simulation tool for the Capacitively Coupled Plasma (CCP) source has been developed and is now commercially available. In this study, the emissions from CCP of C@sub 2@F@sub 6@ as well as COF@sub 2@ have been simulated and the results have been compared with the ones measured by Fourier transform infrared spectroscopy (FT-IR) and Quadrupole mass spectroscopy (QMS), which were equipped after the dry pump. Both results showed that CF@sub 4@ emission from COF@sub 2@ is less than that of C@sub 2@F@sub 6@. The discharge in the CVD chamber was also observed using optical emission spectroscopy (OES) and FTIR. The results have been also compared with the ones simulated. This work is supported by New Energy and Industrial Technology Development Organization (NEDO). @FootnoteText@ @footnote 1@ Y. Mitsui et al., ISESH 2001, June 17-21, 2001.