AVS 49th International Symposium
    Plasma Science Wednesday Sessions
       Session PS+TF-WeP

Paper PS+TF-WeP12
Low-temperature PECVD Thin Film Optical Waveguides

Wednesday, November 6, 2002, 11:00 am, Room Exhibit Hall B2

Session: Plasma Etching & Deposition
Presenter: G.T. Dalakos, General Electric Global Research Center
Authors: G.T. Dalakos, General Electric Global Research Center
E.M. Breitung, General Electric Global Research Center
Correspondent: Click to Email
The ability to process inorganic thin film optical waveguides at low deposition temperatures (room temperature to <200C) allows compatibility with a large range of different material types. Notably, these include low-melting point optical polymers. However, most work in inorganic waveguide fabrication has been at high processing temperatures or involved high-temperature post-processing anneal steps which is incompatible with low-melting point materials. We offer insight into performance degradation, especially in regards to the processing of silicon alloy materials at low substrate temperatures in a conventional Plasma-enhanced Chemical Vapor Deposition (PECVD) setup. Optical loss due to interfacial surface roughness and bulk material absorption are focused on and processing methods to reduce both of these are presented.