AVS 49th International Symposium
    Processing at the Nanoscale Thursday Sessions
       Session PN-ThA

Paper PN-ThA4
Nanometer Scale Patterning of Dielectric Surfaces with Combined Electron/laser Beams and Chemical Exposure

Thursday, November 7, 2002, 3:00 pm, Room C-109

Session: Charged Particle Patterning and Emission
Presenter: K.H. Nwe, Washington State University
Authors: K.H. Nwe, Washington State University
J.T. Dickinson, Washington State University
Correspondent: Click to Email
We examine the nanometer scale patterning of insulating surfaces exposed to simultaneous beams of radiation and reactive chemicals. Specifically, we show that ionic crystals in the presence of low pressure water exposure leads to rapid material etching in self-organized patterns under UV laser or keV electron irradation. Radiation effects on reactive layers on single crystal inorganics are poorly understood. We find that dense ordered arrays of highly oriented nanoscale conical structures, with aspect ratios greater than 200, are produced under such exposure. We show that the nanostructure formation mechanism involves photo/electron stimulated decomposition of the matrix via defect mediated interactions. Using time resolved mass spectroscopy we are able to provide detailed kinetics for these electronic etching processes.