| IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
| Thin Films | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-ThA1 Invited Paper Ionized-PVD with Quasi-Stationary High Power Magnetron Sputtering U. Helmersson, J. Alami, Linköping University, Sweden, A.P. Ehiasarian, K.M. Macák, Sheffield Hallam University, UK, J.T. Gudmundsson, University of Iceland |
| 2:40pm | TF-ThA3 Ionization of Sputtered Titanium Atoms in Radio Frequency Magnetron Sputtering K. Okimura, T. Nakamura, Tokai University, Japan |
| 3:00pm | TF-ThA4 High Rate Growth of Cu Thin Films Using New Magnetron Sputtering Source H.K. Park, K.H. Nam, J.G. Han, J.-H. Boo, Sungkyunkwan University, Korea |
| 3:40pm | TF-ThA6 Low Temperature Hollow Cathode Sputter Deposition of Al@sub 2@O@sub 3@ Thin Films A. Pradhan, S.I. Shah, K.M. Unruh, University of Delaware |
| 4:00pm | TF-ThA7 Influence of the Growth Conditions of AlN Films by Laser Ablation A. Basillais, C. Boulmer-Leborgne, GREMI, France, J. Perriere, GPS, France |
| 4:20pm | TF-ThA8 Low Temperature and Plasma Damage Free Deposition of Silicon Dioxide on Novel Film Deposition Method Called a Radical Shower-CVD (RS-CVD) A. Kumagai, K. Ishibashi, X. Ge, M. Tanaka, H. Nogami, O. Okada, Anelva Corporation, Japan |