IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Semiconductors Wednesday Sessions

Session SC+SS+EL-WeA
Chemistry of Semiconductor Etching & Cleaning

Wednesday, October 31, 2001, 2:00 pm, Room 111
Moderator: G. McGuire, MCNC


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm SC+SS+EL-WeA1 Invited Paper
The Chemistry of Anisotropic Silicon Etching: Tackling an Old Problem with New Tricks
M.A. Hines, Cornell University
2:40pm SC+SS+EL-WeA3
In situ Infrared Spectroscopy of Wet Chemical Etching of Si and InP with Electrochemical Control
O. Pluchery, S.B. Christman, Y.J. Chabal, Agere Systems
3:00pm SC+SS+EL-WeA4
Atomic Hydrogen Etching in Hot Wire Chemical Vapor Deposition System of Silicon Thin Films
E. Gulari, O. Srivannavit, University of Michigan
3:20pm SC+SS+EL-WeA5
Single Ion Impact Effects on Semiconductor and Insulator Surfaces Induced by Slow, Very Highly Charged Ions
T. Schenkel, Lawrence Berkeley National Laboratory, A.V. Hamza, J.W. McDonald, D.H. Schneider, A. Kraemer, A. Persaud, Lawrence Livermore National Laboratory
3:40pm SC+SS+EL-WeA6
Ex Situ Removal of Carbon and Oxygen from a Gallium Nitride (0001) Surface
F. Machuca, Z. Liu, Y Sun, R.F.W. Pease, W.E. Spicer, Stanford University, P. Pianetta, SSRL and Stanford University
4:00pm SC+SS+EL-WeA7
The Study of InP(100) Chemical Cleaning by Synchrotron Radiation Photoemission Spectroscopy
Y Sun, F. Machuca, Z. Liu, Stanford University, P. Pianetta, Stanford Synchrotron Radiation Lab, W.E. Spicer, Stanford University
4:20pm SC+SS+EL-WeA8
Ion Irradiation Induced Spontaneous Nanoscale Corrugation on Silicate Glasses
C.C. Umbach, Cornell University, R.L. Headrick, Cornell High Energy Synchrotron Source, K.-C. Chang, J.M. Blakely, Cornell University