IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Semiconductors Wednesday Sessions
       Session SC+SS+EL-WeA

Paper SC+SS+EL-WeA8
Ion Irradiation Induced Spontaneous Nanoscale Corrugation on Silicate Glasses

Wednesday, October 31, 2001, 4:20 pm, Room 111

Session: Chemistry of Semiconductor Etching & Cleaning
Presenter: C.C. Umbach, Cornell University
Authors: C.C. Umbach, Cornell University
R.L. Headrick, Cornell High Energy Synchrotron Source
K.-C. Chang, Cornell University
J.M. Blakely, Cornell University
Correspondent: Click to Email
Grazing incidence x-ray scattering was used to determine the temperature and ion-energy dependence of nanoscale corrugations that form on an amorphous SiO@sub 2@ surface eroded by Ar@super +@ ions. The corrugations have wavelengths between 20 and 200 nm with amplitudes of 1 nm. The corrugation wavelength @lambda@@super *@ shows a nearly linear dependence on ion energy for ion energies between 0.5 and 2 keV. Between room temperature and ~300° C, @lambda@@super *@ depends weakly on temperature and above ~300° it shows an Arrhenius-like increase. Ion-assisted viscous relaxation in a thin surface layer is shown to be the dominant smoothing process during erosion;the rate of viscous smoothing scales as (@lambda@@super *@)@super -4@. Similar ion-induced corrugations have also been observed on aluminoborosilicate glasses.