| IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
| Plasma Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 9:40am | PS2-MoM1 Optical Emission Spectroscopy of Exhaust Stream Gases for Improved Process Control G. Powell, Lightwind Inc., C.T. Gabriel, Advanced Micro Devices |
| 10:00am | PS2-MoM2 Peak Wafer Temperature Measurements during Dielectric Etching in a MERIE Etcher C.T. Gabriel, Advanced Micro Devices |
| 10:20am | PS2-MoM3 Spatially (z)-Resolved Electron Temperatures and Species Concentrations in Inductively-Coupled Chlorine Plasmas, Measured by Trace-Rare Gases Optical Emission Spectroscopy V.M. Donnelly, Agere Systems, M.J. Schabel, Bell Laboratories, Lucent Technologies |
| 10:40am | PS2-MoM4 Invited Paper Diagnostic of Silicon Etch Plasmas by Optical and Mass Spectrometry, Correlation with XPS Surface Diagnostics N. Sadeghi, University Joseph Fourier-Grenoble and CNRS, France, G. Cunge, R.L. Inglebert, L. Vallier, LTM/CNRS (CEA-LETI), France, O. Joubert, CNRS, France |
| 11:20am | PS2-MoM6 Electrical and Plasma Property Measurements of a DRIE Bosch Process I.C. Abraham, P.A. Miller, J.R. Woodworth, C.G. Willison, R.J. Shul, Sandia National Laboratories |