| IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
| Plasma Science | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS2+TF+SE-TuA1 Invited Paper Mechanisms Involved in the PECVD of Thin Films in Low Pressure Organosilicon Plasmas A. Granier, A. Goullet, K Aumaille, G. Borvon, Institut des Matériaux Jean Rouxel, France, C. Vallee, LEMD, France, G. Turban, Institut des Matériaux Jean Rouxel, France |
| 2:40pm | PS2+TF+SE-TuA3 Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD) of ZrO@sub 2@ on Silicon B.O. Cho, J. Wang, S.X. Lao, J.P. Chang, University of California, Los Angeles |
| 3:00pm | PS2+TF+SE-TuA4 Deposition of a-C:H Films: Plasma Chemistry and Material Properties J. Benedikt, K.G.Y. Letourneur, Eindhoven University of Technology, The Netherlands, M. Wisse, Free University, The Netherlands, D.C. Schram, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |
| 3:20pm | PS2+TF+SE-TuA5 Study of SiO@sub x@N@sub y@ Films Deposited by Radio-Frequency Plasma Assisted Electron Cyclotron Resonance J.D. Brewer, University of North Carolina at Chapel Hill, A. Raveh, NRCN Division of Chemistry, Israel, E.A. Irene, University of North Carolina at Chapel Hill |
| 4:20pm | PS2+TF+SE-TuA8 An In Situ Study of the Interactions of Atomic Deuterium with Hydrogenated Amorphous Silicon Thin Films Using Multiple Total Reflection Fourier Transform Infrared Spectroscopy S. Agarwal, University of California, Santa Barbara, A. Takano, Fuji Electric Corporate Research and Development, Ltd., Japan, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands, D. Maroudas, E.S. Aydil, University of California, Santa Barbara |
| 4:40pm | PS2+TF+SE-TuA9 A New and Fast In-situ Spectroscopic Infrared Absorption Measurement Technique for Submonolayer Detection at High Growth Rate M.F.A.M. van Hest, A. Klaver, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |
| 5:00pm | PS2+TF+SE-TuA10 Invited Paper Reaction Mechanism of PECVD to Produce Low Dielectric Constant Thin Films Y. Shimogaki, University of Tokyo, Japan |