| IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
| Plasma Science | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS1-TuA1 Gas Phase and Surface Diagnostic Measurements of High-density Plasma-based Etching Processes for Dielectrics Based on C@sub 4@F@sub 8@ Gas Mixtures with Ar, O@sub 2@ and N@sub 2@ X. Li, University of Maryland, M. Fukasawa, Sony Corporation, Japan, G.S. Oehrlein, University of Maryland, M. Barela, H.M. Anderson, University of New Mexico |
| 2:40pm | PS1-TuA3 Invited Paper A 0.09µm-capable Plasma Etching of Dielectrics and its Reaction Mechanism S. Tachi, Hitachi, Ltd., Japan, J. Ghormley, Hitachi America Ltd. |
| 3:20pm | PS1-TuA5 Plasma Etching Chemistry and Kinetics for Silicon Oxide Thin Films O. Kwon, H.H. Sawin, Massachusetts Institute of Technology |
| 3:40pm | PS1-TuA6 Oxide Etch Behavior in an Inductively Coupled C@sub 4@F@sub 8@ Discharge Characterized by Diode Laser Spectroscopy H.M. Anderson, M. Barela, G. Courtin, University of New Mexico, K.S. Waters, Intel |
| 4:20pm | PS1-TuA8 Characterization of Hydrofluorocarbon Reactants for Selective Silicon Nitride Plasma Etch Applications E.A. Hudson, H. Zhu, D. Pirkle, J. Luque, Lam Research Corp., J.P. Booth, Ecole Polytechnique, France |
| 4:40pm | PS1-TuA9 Modeling of SiO@sub 2@ Feature Etching in Fluorocarbon Plasmas: The Effect of Gas Phase Composition on Aspect Ratio Dependent Phenomena G. Kokkoris, E. Gogolides, National Center for Scientific Research (NCSR) "Demokritos", Greece, A.G. Boudouvis, National Technical University of Athens (NTUA), Greece |
| 5:00pm | PS1-TuA10 Inductively Coupled Plasma Etching for Arrayed Waveguide Grating Fabrication in Silica on Silicon Technology S. Bretoiu, D. Di Mola, E. Fioravanti, S. Visona, Agilent Italy |