IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11), Session PS-WeA

IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
Plasma Science	Wednesday Sessions

Session PS-WeA
Plasma Surface Interactions II

Wednesday, October 31, 2001, 2:00 pm, Room 104
Moderator: E.R. Fisher, Colorado State University

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Click a paper to see the details. Presenters are shown in bold type.

2:00pm	PS-WeA1 Laser Desorption-Laser Induced Fluorescence In situ Studies of Si Etching in Inductively-Coupled Cl@sub 2@-Ar Plasmas N.C.M. Fuller, Columbia University, V.M. Donnelly, Agere Systems, I.P. Herman, Columbia University
2:20pm	PS-WeA2 Monitoring Plasma-Wall Interactions During Etching of Thin Film Stacks S.J. Ullal, University of California, Santa Barbara, H. Singh, J. Daugherty, V. Vahedi, Lam Research Corporation, E.S. Aydil, University of California, Santa Barbara
3:00pm	PS-WeA4 Controlling the Ion Flux and Energy Distributions in LAPPS@footnote 1@ S.G. Walton, D. Leonhardt, D.D. Blackwell, D.P. Murphy, R.F. Fernsler, R.A. Meger, Naval Research Laboratory
3:20pm	PS-WeA5 High-Density Plasma-Based Etching of Organosilicate Glass (OSG) in C@sub 4@F@sub 8@/Ar and C@sub 4@F@sub 8@/O@sub 2@ Gas Mixtures: Process Results and Diagnostics M. Fukasawa, X. Li, X. Wang, L. Ling, G.S. Oehrlein, University of Maryland, College Park, F.G. Celii, K.H.R. Kirmse, Texas Instruments, Inc.
3:40pm	PS-WeA6 Invited Paper Plasma Deposition of Silicon Thin Films: Atomic-Scale Modeling of Radical-Surface Interactions D. Maroudas, University of California, Santa Barbara
4:20pm	PS-WeA8 Molecular Dynamics Simulations of Ar@super +@-Si and Si:F Interactions D.B. Graves, D. Humbird, University of California at Berkeley
4:40pm	PS-WeA9 Atomic-Scale Simulation Study of the Role of H Atoms in the Amorphous to Nanocrystalline Transformation in Plasma-Deposited Silicon Thin Films S. Sriraman, E.S. Aydil, D. Maroudas, University of California, Santa Barbara
5:00pm	PS-WeA10 A Fast Computational Model for Study of Coupled Bulk Plasma-Sheath-Bias Circuit Phenomena and its Effect on Plasma-Surface Interactions L.L. Raja, Colorado School of Mines, E. Meeks, Reaction Design, Inc.