| IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
| Applied Surface Analysis | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| AS-TuP1 XPS and XAES Characterisation of the Interaction of Copper-containing Alloys with Ultra-pure Water in Oxidising and Reducing Conditions J.E. Castle, P.A. Zhdan, University of Surrey, U.K. |
| AS-TuP2 Non-destructive Depth Profiling Analysis of @beta@-FeSi@sub2@ Formation Process by SR-XPS T. Saito, H. Yamamoto, H. Asaoka, K. Hojou, Japan Atomic Energy Research Institute, M. Imamura, N. Matsubayashi, H. Shimada, National Institute of Advanced Industrial Science and Technology, Japan |
| AS-TuP3 X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy Studies of the Effect of a Pre-oxidation Clean on Boron And Residual Fluorine Distributions in Ultra-shallow Junction BF2+ Implants E.G. Garza, S.N. Raman, Advanced Micro Devices |
| AS-TuP4 X-ray Photoelectron Spectroscopy Study of As-implanted and Annealed Ultra Shallow Junction 75As+ Implants S.N. Raman, E.G. Garza, Advanced Micro Devices |
| AS-TuP5 The Particularities of In-line Control Tools Employing Electron Spectroscopic Methods L. Vasilyev, C. Bryson, D. Klyachko, B. Linder, Surface Interface Inc. |
| AS-TuP6 High Spatial Resolution Auger Microanalysis of FIB Prepared Samples A.L. Linsebigler, M. Larsen, General Electric Corporate Research and Development Center |
| AS-TuP7 Applications of AFM/SCM in Process Control and Failure Analysis of Semiconductor Devices K.-J. Chao, J.R. Kingsley, H. Ho, H. Shen, I.D. Ward, Charles Evans & Associates |
| AS-TuP8 Surface Analysis of Shock-compacted Nd-system Superconductor H. Kezuka, Tokyo University of Technology, Japan, M. Kikuchi, K. Fukuoka, E. Ohshima, Tohoku University, Japan, S. Yoshizawa, Meisei University, Japan, T. Suzuki, Tokai University, Japan |
| AS-TuP9 Surface Oxidation of NiTi Shape Memory Alloy R.G. Vitchev, Katholieke Universiteit Leuven, Belgium, G.S. Firstov, On leave of absence from National Academy of Sciences of Ukraine, H. Kumar, B. Blanpain, J. Van Humbeeck, Katholieke Universiteit Leuven, Belgium |
| AS-TuP10 Structure and Corrosion Properties of PVD CrN Coatings C. Liu, Loughborough University, UK, Q. Bi, Hull University, UK, H. Ziegele, BMW Group, Germany, A. Leyland, A. Matthews, Hull University, UK |
| AS-TuP11 Analysis of Boron-, Germanium- and Fluorine Diffusion through a SiO@sub 2@ Gate Oxide Into Silicon using Secondary Ion Mass Spectrometry F. Persson, H. Svensson, U. Södervall, M. Willander, Chalmers University of Technology, Sweden |