IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Applied Surface Analysis Tuesday Sessions
       Session AS-TuP

Paper AS-TuP3
X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy Studies of the Effect of a Pre-oxidation Clean on Boron And Residual Fluorine Distributions in Ultra-shallow Junction BF2+ Implants

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Aspects of Applied Surface Analysis II Poster Session
Presenter: E.G. Garza, Advanced Micro Devices
Authors: E.G. Garza, Advanced Micro Devices
S.N. Raman, Advanced Micro Devices
Correspondent: Click to Email
The distribution of as-implanted boron and fluorine in ultra-shallow junction 49BF2+ implants was investigated using X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). The effects of a pre-oxidation clean following low energy, high-dose 49BF2+ implants (LEHD) were also investigated. Auger and XPS depth profiles and angle-resolved XPS (ARXPS) studies reveal significant dopant retention in the native oxide and subsequent high degrees of dopant loss due to removal of the native oxide during a standard SPM/APM/HPM clean process. Fluorine Auger parameter analysis was also performed to identify changes in fluorine binding states.