IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Plasma Science Tuesday Sessions
       Session PS-TuP

Paper PS-TuP6
Control of Dissociation by Different Dilution Gases for Plasma Processing

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Plasma Deposition, Modeling, and Emerging Applications Poster Session
Presenter: KJ Taylor, University of California, San Diego
Authors: KJ Taylor, University of California, San Diego
S.M. Yun, Lam Research Corporation
Y.J. Park, Samsung Electronics Corporation
G.R. Tynan, University of California, San Diego
Correspondent: Click to Email
Electron temperature and electron density are modeled by using simple 0-d particle and power balance modeling and measured by Langmuir probe in pure He, Ar, and Xe plasmas. Trace amounts of oxygen gas is added to each of the inert gas plasma and dissociation of oxygen gas is studied by actinometry and by mass spectroscopy with various powers and various ratios of O2/inert gas. Reasonable agreement between these results and the neutral atomic oxygen density estimated using a simple model based on the measured electron density and temperature. Preliminary dissociation results using fluorocarbon will also be shown.