IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Plasma Science Tuesday Sessions
       Session PS-TuP

Paper PS-TuP14
Numerical Optimization of a C@sub 4@F@sub 8@ Chamber Clean Recipe

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Plasma Deposition, Modeling, and Emerging Applications Poster Session
Presenter: G.I. Font, Kinema Research
Authors: G.I. Font, Kinema Research
B. Devulapalli, Fluent, Inc.
W.L. Morgan, Kinema Research
Correspondent: Click to Email
Plasma deposition reactors are regularly subjected to non-value added cleaning schedules to eliminate build up inside the reactor. Cleaning minimizes flaking and particle shedding which can contaminate or destroy the integrated circuits being created on the wafer. If the cleaning step can be made as fast as possible, the down time for the tool can be minimized. Recently much effort has been devoted to the optimization of plasma reactor clean recipes. The criteria for optimization vary from clean time and expense of feed gas to environmental emissions of PFC’s. Parameters which are usually considered for optimization include total gas feed rate, pressure, and mixture ratios of feed gasses. Optimizing studies require costly and time consuming experimentation. If the studies could be conducted numerically, the expense would be greatly reduced. The optimum point could also be tailored for specific reactor geometries. In this work, we use computational methods to optimize a C4F8 chamber clean chemistry. Comparison with experimental results shed light on the viability of conducting such optimizations numerically and give a unique perspective on the change in plasma constituents as the process parameters are varied.