IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Plasma Science Tuesday Sessions
       Session PS-TuP

Paper PS-TuP10
Scalability of Innovative ICP Source Geometries

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Plasma Deposition, Modeling, and Emerging Applications Poster Session
Presenter: L.J. Pratti, University of Texas at Dallas
Authors: L.J. Pratti, University of Texas at Dallas
J.M. Marquis, University of Texas at Dallas
M. Goeckner, University of Texas at Dallas
L.J. Overzet, University of Texas at Dallas
Correspondent: Click to Email
As industry moves towards plasma processing on larger substrates, there is a need for larger plasma sources. Due to transmission line effects, large traditional planar ICP sources produce non-uniform plasmas, and thus non-uniform processing rates across the substrate. Recently, a three-dimensional coil geometry which can reduce these non-uniformities was introduced.@footnote 1@ In this paper, we examine standing wave effects on the field intensities and uniformities when a current node is present on the planar and various 3-D coils. Preliminary experiments show uniformity improves by a factor of 3 or more using the 3-D coil. The location of the node on the coil is found using a dynamic current probe. The field measurements are made with a B-dot probe in the absence of plasma. A separate paper presents the results of a predictive model of the system. @FootnoteText@ This material is based in part upon work supported by the Texas Advanced Technology Program under Grant No. 009741-0081-1999. @footnote 1@M. H. Khater, L. J. Overzet, Plasma Sources Sci. Technol. 9 (2000) 545-561.