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    Plasma Science Friday Sessions
       Session PS-FrM

Paper PS-FrM9
Characteristics of the LAPPS Ion Flux to an RF Biased Surface

Friday, November 2, 2001, 11:00 am, Room 104

Session: Diagnostics III
Presenter: D.D. Blackwell, US Naval Research Laboratory
Authors: D.D. Blackwell, US Naval Research Laboratory
S.G. Walton, US Naval Research Laboratory
D. Leonhardt, US Naval Research Laboratory
D.P. Murphy, US Naval Research Laboratory
R.F. Fernsler, US Naval Research Laboratory
R.A. Meger, US Naval Research Laboratory
Correspondent: Click to Email
The ion flux properties are possibly the most critical parameters in a process plasma. Every industrial plasma process, from sputtering to deposition, is highly dependent on the density, energy, and composition of the ions. At NRL, we have been experimenting with electron-beam produced plasmas as an alternative to radiofrequency (RF) driven discharges. The most promising of these sources is the hollow cathode driven Large Area Plasma Processing System. This source is designed to produce large area (> 1 m@super 2@), high density, uniform sheets of plasma. In this presentation we will show measurements of the ion energy distribution function (IEDF) from continuous and pulsed electron beam plasmas produced in 20-30 wide, 1 cm thick sheets by a 2 kV hollow cathode. The IEDF is obtained using a gridded energy analyzer incorporated into a RF biasable stage. The surface flux and IEDF in the presence of large RF voltages applied to the stage will be presented. We will also be comparing the IEDF's taken in a pulsed system and a continuous current system during the "beam on" and afterglow periods to observe their temporal evolution. Typical operating conditions are 15-20 millitorr of argon, oxygen, or nitrogen, and 150-200 Gauss magnetic field.