| 8:20am |
TF-MoM1 Invited Paper
Atomic Layer Deposition of Microelectronic Materials: The Present Status and Future Challenges
M.K. Ritala, University of Helsinki, Finland |
| 9:00am |
TF-MoM3
Atomic Layer Deposition of BN Using Sequential Exposures of BCl@sub 3@ and NH@sub 3@
J.D. Ferguson, S.J. Ferro, S.M. George, University of Colorado |
| 9:20am |
TF-MoM4
Thermal Stability of Si and C Atomic Layers Formed on Ge(100) in Silane and Methylsilane Reactions
M. Fujiu, M. Sakuraba, T. Matsuura, J. Murota, Tohoku University, Japan |
| 9:40am |
TF-MoM5 Invited Paper
Selective Growth of ZnO Thin Film on Microprinted Si Substrate
M. Yan, R.P.H. Chang, J. Ni, J.R. Babcock, T.J. Marks, Northwestern University |
| 10:20am |
TF-MoM7
Electrical Characterization of Ultrathin Al@sub 2@O@sub 3@ Films Grown by Atomic Layer Deposition in a Viscous Flow Reactor
M.D. Groner, J.W. Elam, S.M. George, University of Colorado |
| 10:40am |
TF-MoM8
A Study on the Characteristics of TiAlN Thin Film Deposited by Atomic Layer Chemical Vapor Deposition Method
H. Jeon, J.W. Lee, J.H. Koo, T.H. Doh, Y.D. Kim, Hanyang University, South Korea |