| AVS 47th International Symposium | |
| Thin Films | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-MoA1 The Effect of Atomic Layer CVD Flow Parameters on the Growth Orientation of AlN Thin Films J.N. Kidder, J.W. Rogers, T.P. Pearsall, University of Washington |
| 2:20pm | TF-MoA2 Atomic Layer Deposition (ALD) Films for Advanced Capacitors O. Sneh, R.C. Phelps, T. Seidel, Genus, Inc. |
| 2:40pm | TF-MoA3 Invited Paper Tungsten Atomic Layer Deposition: Nucleation and Growth on Oxide Surfaces S.M. George, J.W. Klaus, J.W. Elam, C.E. Nelson, R.K. Grubbs, S.J. Ferro, University of Colorado |
| 3:20pm | TF-MoA5 Invited Paper Radical Enhanced Atomic Layer Deposition (ALD) of Diffusion Barrier Films at Low Temperatures A. Sherman, F. Turner, Sherman & Associates, C. Pan, ASM America, S.M. Rossnagel, IBM T.J. Watson Research Center |
| 4:00pm | TF-MoA7 Vacuum Beam Studies of Radical Enhanced Atomic Layer Chemical Vapor Deposition F. Greer, D. Fraser, J.W. Coburn, D.B. Graves, University of California, Berkeley |