AVS 47th International Symposium | |
Semiconductors | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | SC1+EL+SS-MoM1 Atomic-Order Thermal Nitridation of Si(100) and Subsequent Epitaxial Growth of Si T. Watanabe, M. Sakuraba, T. Matsuura, J. Murota, Tohoku University, Japan |
8:40am | SC1+EL+SS-MoM2 The Role of Inter-dimer Interactions in NH@sub 3@ Dissociation on Si(100) - (2 x 1) K.T. Queeney, Smith College, K. Raghavachari, Y.J. Chabal, Bell Laboratories, Lucent Technologies |
9:00am | SC1+EL+SS-MoM3 Quantum Chemical Study of Silicon Nitride Deposition Using Ammonia Y. Widjaja, C.B. Musgrave, Stanford University |
9:20am | SC1+EL+SS-MoM4 Thermal Nitridation of Ultrathin Silicon Dioxide Films Using NH@sub 3@ Gas O. Jintsugawa, M. Sakuraba, T. Matsuura, J. Murota, Tohoku University, Japan |
9:40am | SC1+EL+SS-MoM5 Invited Paper Probing the Chemistry of Dielectric Thin Film Growth on Si Surfaces L.D. Flores, J.E. Crowell, University of California, San Diego |
10:20am | SC1+EL+SS-MoM7 Thickness Control of an Ultrathin Oxide Film on Si(100)2x1 Synthesized by Ozone: A Kinetic Study on Initial Oxidation K. Nakamura, A. Kurokawa, H. Itoh, S. Ichimura, Electrotechnical Laboratory, Japan |
10:40am | SC1+EL+SS-MoM8 FTIR at Liquid/Solid Interfaces: In-situ Studies of HF Etching of SiO@sub 2@ on Si(100) K.T. Queeney, Smith College Department of Chemistry, E.E. Chaban, Y.J. Chabal, Bell Laboratories, Lucent Technologies |