AVS 47th International Symposium | |
Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | PS2-ThM1 Advanced Actinometry of Inductively Coupled Cl@sub 2@-Ar Plasmas For Plasma Etching N.C.M. Fuller, I.P. Herman, Columbia University, V.M. Donnelly, Bell Laboratories, Lucent Technologies |
8:40am | PS2-ThM2 Diagnostics of Inductively Coupled Chlorine Plasmas: Measurements of the Neutral Gas Temperature V.M. Donnelly, M.V. Malyshev, Bell Laboratories, Lucent Technologies |
9:00am | PS2-ThM3 A New Diagnostic Method for Monitoring Plasma Reactor Walls: Multiple Total Internal Reflection Infrared Surface Probe A.R. Godfrey, S.J. Ullal, E.S. Aydil, University of California, Santa Barbara, E.A. Edelberg, L.B. Braly, V. Vahedi, Lam Research Corporation |
9:20am | PS2-ThM4 Invited Paper Laser-Aided Diagnostics of Discharge Plasmas K. Muraoka, K. Uchino, M. Bowden, M. Maeda, Kyushu University, Japan |
10:00am | PS2-ThM6 Energy Distributions of Incident Ions to a RF-Biased Substratep H. Kawada, N. Tsumaki, Hitachi Ltd., Japan |
10:20am | PS2-ThM7 Energy and Angular Distribution of Ions Effusing from a Hole in Contact with a High Density Plasma D. Kim, C.-K. Kim, D.J. Economou, University of Houston |
10:40am | PS2-ThM8 Electron Temperature and Ion Energy Measurements with A High-resolution, Sub-micron, Retarding Field Analyzer M.J. Sowa, M.G. Blain, R.L. Jarecki, J.E. Stevens, Sandia National Laboratories |
11:00am | PS2-ThM9 Mass Resolved Ion Energy Distribution Measurements in an Inductively Coupled H@sub 2@/Ar Plasma with a Highly Collisional Presheath S. Agarwal, D. Maroudas, E.S. Aydil, University of California, Santa Barbara |
11:20am | PS2-ThM10 Langmuir Probe Analysis for High Density Plasmas F.F. Chen, University of California, Los Angeles |
11:40am | PS2-ThM11 Single Photon Ionization as a Probe of Radicals in Hot-Wire and Plasma Processing H.L. Duan, S.F. Bent, Stanford University |