| AVS 47th International Symposium | |
| Incorporating Principles of Industrial Ecology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | IE+PS+MS+SE-WeM1 Invited Paper CVD Films as Directly Patternable Low-k Dielectrics K.K. Gleason, H.G. Pryce Lewis, Massachusetts Institute of Technology, G.L. Weibel, C.K. Ober, Cornell University |
| 9:00am | IE+PS+MS+SE-WeM3 Characterization of Remote Plasma Clean Process for Plasma CVD Chamber T. Tanaka, T. Nowak, M. Seamons, B.H. Kim, K. Lai, M. Cox, P. Loewenhardt, D. Silvetti, S. Shamouilian, Applied Materials Inc. |
| 9:20am | IE+PS+MS+SE-WeM4 Silicon Oxide Contact Hole Etching Process Employing Environmentally Harmonized Technique K. Fujita, M. Hori, T. Goto, Nagoya University, Japan, M. Ito, Wakayama University, Japan |
| 9:40am | IE+PS+MS+SE-WeM5 Photocatalytic, Anti-fogging Mirror K. Takagi, H. Hiraiwa, T. Makimoto, T. Negishi, ULVAC Japan, Ltd. |
| 10:00am | IE+PS+MS+SE-WeM6 Low-k Materials Etching in Magnetic Neutral Loop Discharge Plasma Y. Morikawa, S. Yasunami, W. Chen, T. Hayashi, H. Yamakawa, T. Uchida, ULVAC JAPAN Ltd. |