AVS 47th International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS-TuP

Paper PS-TuP26
The Effects of Electrostatic Bias on the Radial Plasma Potential Profile in a Helicon Plasma

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D

Session: Poster Session
Presenter: S.W. Lee, Korea Advanced Institute of Science and Technology
Authors: S.W. Lee, Korea Advanced Institute of Science and Technology
S.H. Jun, Korea Advanced Institute of Science and Technology
S.H. Uhm, Korea Advanced Institute of Science and Technology
Y. Lee, Korea Advanced Institute of Science and Technology
H.Y. Chang, Korea Advanced Institute of Science and Technology
Correspondent: Click to Email
The effects of electrostatic bias on the radial plasma potential profile has been studied in a helicon plasma. Two types of electrode - ring and planar type - were used. Electrodes were floated, negatively, and positively biased. The radial profile of ion density and plasma potential were measured with Langmuir probe. The ion velocity distribution function was measured with Doppler shifted laser induced fluorescence technique. The floating and negatively biased electrode gives similar result on plasma potential and ion density. The positive bias increases the plasma potential as high as the electrode voltage. The hollow plasma potential profile was formed when ring electrode was used. The profile is affected by gas pressure, ion density profile, static magnetic field, electron temperature, ion temperature, and ion flux. We could explain the phenomena with the results of LIF and Langmuir probe measurement.