AVS 47th International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS-TuP

Paper PS-TuP16
Controlled Plasma Characteristics by a Novel Method of Enhanced Inductively Coupled Plasma

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D

Session: Poster Session
Presenter: B.-H. O, Inha University, South Korea
Authors: S.-H. Rha, Inha University, South Korea
C.-W. Kim, Inha University, South Korea
S.-G. Park, Inha University, South Korea
B.-H. O, Inha University, South Korea
Correspondent: Click to Email
It is important to control the electron energy distribution to have high quality plasma process. A conventional inductively coupled plasma(ICP) source with 13.56MHz power is not adequate for low damage sub-half micron patterning process due to higher electron temperature. Only the pulsed plasma technique seems to provide low electron temperature, and thus low process damage. Recently, a novel method proposed by us, named as ‘Enhanced-ICP’, which uses periodic weak axial magnetic field added to a normal ICP source, has shown great improvement in etch characteristics. Novel changes of plasma characteristics according to the frequency of time-varying axial magnetic field have been observed by a time-resolved analysis of Langmuir probe. It is found that the plasma density is increased while the electron temperature is lowered in E-ICP. Furthermore, the spatial plasma distribution is also homogenized by this method. Many evidences on improvement of electron energy distribution and spatial plasma distribution will be discussed for various cases using time-resolved analysis of Langmuir probe and optical emission spectroscopy. Theoretical analysis for this phenom is presented in this paper.