AVS 47th International Symposium
    Processing at the Nanoscale/NANO 6 Wednesday Sessions
       Session NS+NANO6-WeA

Paper NS+NANO6-WeA2
Fabrication of Nanoscale Templates by Chemical Lithography

Wednesday, October 4, 2000, 2:20 pm, Room 302

Session: Nanoscale Modification of Materials
Presenter: A. Gölzhäuser, Universität Heidelberg, Germany
Authors: A. Gölzhäuser, Universität Heidelberg, Germany
W. Geyer, Universität Heidelberg, Germany
V. Stadler, Universität Heidelberg, Germany
W. Eck, Universität Heidelberg, Germany
M. Grunze, Universität Heidelberg, Germany
T. Weimann, Physikalisch Technische Bundesanstalt, Germany
P. Hinze, Physikalisch Technische Bundesanstalt, Germany
K. Edinger, University of Maryland
Correspondent: Click to Email
Nanostructure fabrication requires precise lithographic tools and smart materials that can be modified in a controlled manor. Recently, we discovered that self-assembled monolayers of biphenylthiols are crosslinked by electrons and can be utilized as negative resists.@footnote 1@ Crosslinked biphenyls can also be applied as stabilizing spacer groups during modifications via chemical lithography, specifically the conversion of NO@sub 2@ to NH@sub 2@ end groups.@footnote 2@ Based on these findings, we fabricated templates by high resolution electron beam lithography. We used a Leica LION LV 1 system at a beam energy of 2.5 keV and doses between 10 and 50 mC/cm@super 2@. We also applied a simple and versatile projection technique using FIB structured stencil masks and low energy (50eV) electrons. The templates were characterized by contact and lateral force AFM. The finest structures have lateral dimensions of ~20nm. We show that they can be used for a laterally controlled molecular deposition. @FootnoteText@ @footnote 1@ W. Geyer, V. Stadler, W. Eck, M. Zharnikov, A. Gölzhäuser, M. Grunze, Appl. Phys. Lett. 75, 2401 (1999). @footnote 2@ W. Eck, V. Stadler, W. Geyer, M. Zharnikov, A. Gölzhäuser, M. Grunze, Adv. Materials, in press.