| AVS 46th International Symposium | |
| Vacuum Metallurgy Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 9:00am | VM+TF-TuM3 Invited Paper New Plasma Sources for Ionized PVD D.N. Ruzic, University of Illinois, Urbana, D.B. Hayden, Novellus Systems Inc., D.R. Juliano, M.M.C. Allain, University of Illinois, Urbana |
| 9:40am | VM+TF-TuM5 Simulations and Experimental Measurements of a Hollow Cathode Magnetron Ionized Metal Plasma Deposition System G.I. Font, K.F. Lai, Q. Lu, Novellus Systems, Inc., M.J. Kushner, University of Illinois, Urbana |
| 10:00am | VM+TF-TuM6 Low Temperature Polysilicon Deposition by Ionized Magnetron Sputtering J. Joo, Kunsan National University, Korea |
| 10:20am | VM+TF-TuM7 A Study of the Mechanical Behaviour of Plasma Deposited Silica Films on Polycarbonate and Steel A. Hofrichter, A. Constantinescu, CNRS, Ecole Polytechnique, France, S. Benayoun, E.N.S.A.M, France, P. Bulkin, B. Drévillon, CNRS, Ecole Polytechnique, France |
| 10:40am | VM+TF-TuM8 Carburizing of Tantalum by Radio-Frequency Plasma Assisted CVD A. Rubinshtein, Ben-Gurion University, A. Raveh, NRC-Negev, Israel, J.E. Klemberg-Sapieha, L. Martinu, Ecole Polytechnique, Canada |
| 11:00am | VM+TF-TuM9 Electrical and Pressure Probe Measurements of a Hollow Cathode Magnetron Plasma K.F. Lai, Q. Lu, J. Chau, G.I. Font, Novellus Systems |