| AVS 46th International Symposium | |
| Plasma Science and Technology Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-WeA1 Invited Paper Dielectric Etching : From Oxide to Low k Dielectrics P. Berruyer, LETI (CEA-Grenoble), France, O. Joubert, D. Fuard, CNRS-LTM Grenoble, France, C. Verove, ST-Microelectronics, France, M. Assous, LETI (CEA-Grenoble), France, R. Blanc, H. Feldis, ST-Microelectronics, France, E. Tabouret, LETI (CEA-Grenoble), France, Y. Morand, ST-Microelectronics, France |
| 2:40pm | PS-WeA3 Surface Kinetics Study of Silicon Dioxide Etching with Fluorocarbons in Inductively-coupled Plasmas H. Chae, H.H. Sawin, Massachusetts Institute of Technology |
| 3:00pm | PS-WeA4 Chemical Bonding Arrangement Approach for Selective Radical Generation in High-density, Low-pressure Fluorocarbon Plasma S. Samukawa, T. Mukai, NEC Corporation, Japan |
| 3:20pm | PS-WeA5 Flux Control for High-Aspect-Ratio Contact Hole Etching T. Tatsumi, M. Matsui, Y. Hikosaka, M. Sekine, Association of Super-Advanced Electronics Technologies (ASET), Japan |
| 3:40pm | PS-WeA6 Etching Chemistry and Kinetics of BCB Low-k Dielectric Films S.A. Vitale, H.H. Sawin, Massachusetts Institute of Technology |
| 4:00pm | PS-WeA7 The Effect of Capacitive Coupling on Inductively Coupled Fluorocarbon Plasma Processing M. Schaepkens, N.R. Rueger, State University of New York at Albany, J.J. Beulens, ASM International, The Netherlands, I. Martini, E.A. Sanjuan, X. Li, T.E.F.M. Standaert, P.J. Matsuo, G.S. Oehrlein, State University of New York at Albany |
| 4:20pm | PS-WeA8 High Density Plasmas Etching of Low Dielectric Constant Materials D. Fuard, CNRS, France, O. Joubert, L. Vallier, France Telecom-CNET and CNRS |
| 4:40pm | PS-WeA9 A Mechanism of Oxide to Nitride Selective RIE T. Sakai, T. Ohiwa, Toshiba Corporation Semiconductor Company, Japan |
| 5:00pm | PS-WeA10 SiON SAC Etching Technique Using C@sub 4@F@sub 8@/CH@sub 2@F@sub 2@/Ar Plasma for 0.18µm Technology and Beyond J.H. Kim, J.S. Yu, J.S. Na, J.W. Kim, Y.S. Seol, J.C. Ku, C.K. Ryu, S.J. Oh, S.B. Kim, S.D. Kim, I.H. Choi, Hyundai Electronics Industries Co. Ltd., Korea |