| AVS 46th International Symposium | |
| Organic Electronic Materials Topical Conference | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | OE+EM+AS-TuM1 Invited Paper Electronic Properties of Organic Semiconductor Interfaces I.G. Hill, C. Shen, D. Markiewicz, J. Schwartz, A. Kahn, Princeton University |
| 9:00am | OE+EM+AS-TuM3 Photoemission Characterization of Al/Alq@sub 3@ and Al/LiF/Alq@sub 3@ Interfaces L. Yan, Q.T. Le, Y. Gao, University of Rochester, M.G. Mason, C.W. Tang, Eastman Kodak Company |
| 9:20am | OE+EM+AS-TuM4 Charge Injection vs. Chemical State of Electrode Surfaces in Metal/Alq@sub 3@/Metal Structures C. Shen, I.G. Hill, A. Kahn, Princeton University |
| 9:40am | OE+EM+AS-TuM5 Investigation of the Electronic Structure of Organic Schottky Contacts with Photoemission Spectroscopy: Discrimination Between Interface Dipole, HOMO Offset, Band Bending and Charging Related Spectral Shifts R. Schlaf, G.P. Kushto, L.A. Crisafully, C.D. Merritt, Z.H. Kafafi, US Naval Research Laboratory |
| 10:00am | OE+EM+AS-TuM6 Examination of Band Bending at Organic Semiconductor / Metal Interfaces Studied by Kelvin Probe Method H. Ishii, N. Hayashi, E. Ito, K. Seki, Nagoya University, Japan |
| 10:20am | OE+EM+AS-TuM7 Invited Paper Schottky Energy Barriers and Charge Injection at Metal/Organic Interfaces I.H. Campbell, Los Alamos National Laboratory, B.K. Crone, Lucent Technologies, R.L. Martin, D.L. Smith, Los Alamos National Laboratory, C.J. Neef, J.P. Ferraris, University of Texas, Dallas |
| 11:00am | OE+EM+AS-TuM9 Interfacial Electronic Structures between p-Sexiphenyl and Metals Studied by Electron Spectroscopies E. Ito, H. Oji, H. Ishii, Y. Ouchi, K. Seki, Nagoya University, Japan |
| 11:20am | OE+EM+AS-TuM10 A Photoemission Investigation of Interfaces of poly(2, 5-diheptyl-1,4-phenylene-alt-2,5-thienylene) with an oligomer (p-sexiphenyl) and a Metal - Calcium A. Rajagopal, Univ. Notre-Dame, Belgium, N Koch, Tech. Univ. Graz, Austria, J Ghijsen, Univ. Notre-Dame, Belgium, K. Kaeriyama, Kyoto Inst. of Tech., Japan, R.L Johnson, Univ. Hamburg, Germany, G. Leising, Tech. Univ. Graz, Austria, J.J. Pireaux, Univ. Notre-Dame, Belgium |
| 11:40am | OE+EM+AS-TuM11 A Photoelectron Study of Chemically Treated Indium Tin Oxide Surface and Its Reactivity with Phenyl-Diamine Q.T. Le, F. Nuesch, E.W. Forsythe, L.J. Rothberg, Y. Gao, University of Rochester |