| AVS 46th International Symposium | |
| Applied Surface Science Division | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | AS-FrM1 LEIS Measurement of Target Mass in the Presence of Inelastic Energy Losses@footnote 1@ R. Bastasz, J.A. Whaley, Sandia National Laboratories |
| 8:40am | AS-FrM2 Atmospheric Electron X-ray Spectrometer J. Feldman, J.Z. Wilcox, T. George, Jet Propulsion Laboratory, D.N. Barsic, A. Scherer, T. Doll, Caltech |
| 9:00am | AS-FrM3 Invited Paper Advances in X-ray Photoemission Spectroscopy at Very High Spatial and Spectral Resolution B.P. Tonner, R. Kneedler, University of Central Florida, K. Pecher, California Institute of Technology, T. Warwick, Lawrence Berkeley National Laboratory |
| 9:40am | AS-FrM5 An Evaluation of the ALS Micro-ESCA Beam Line Performance for Small Particle Analysis C.R. Brundle, Y. Uritsky, G. Conti, Applied Materials, Inc., P. Kinney, MicroTherm, LLC, Y. Ynzunza, Intel Corporation, E. Principe, Charles Evans and Associates |
| 10:00am | AS-FrM6 A Study of TOF-SIMS for the Analysis of Metal Contamination on Silicon Wafers I.A. Mowat, T.J. Schuerlein, J. Metz, R. Brigham, D. Huffaker, Charles Evans & Associates |
| 10:20am | AS-FrM7 Fundamental Studies of Polymer and Protein Cationization by ToF-SIMS R Michel, R. Luginbuehl, D.J. Graham, B.D. Ratner, University of Washington |
| 10:40am | AS-FrM8 Synchrotron TXRF Quantification Using Ion Implanted Standards R.L. Opila, J.P. Chang, J. Eng, Jr., J.R. Rosamilia, Bell Labs, Lucent Technologies, P. Pianetta, Stanford University, F.A. Stevie, R.F. Roberts, M.A. Decker, Bell Labs, Lucent Technologies |
| 11:00am | AS-FrM9 A Comparative Evaluation of FIB CVD Processes B.I. Prenitzer, B.W. Kempshall, L.A. Giannuzzi, University of Central Florida, S.X. Da, FEI Company, F.A. Stevie, Cirent Semiconductor (Lucent Technologies) |
| 11:20am | AS-FrM10 High Resolution Sum Frequency Generation of a Rubbed Octadecyltriethoxysilane Self Assembled Monolayer on Glass T.E. Furtak, B.C. Chow, Colorado School of Mines |
| 11:40am | AS-FrM11 The Use of Field Ionization Methods to Probe the Influence of High Interfacial Electric Fields on Electrochemical Phenomena V.K. Medvedev, D.L. Scovell, C.J. Rothfuss, E.M. Stuve, University of Washington |