AVS 46th International Symposium
    Applied Surface Science Division Friday Sessions
       Session AS-FrM

Invited Paper AS-FrM3
Advances in X-ray Photoemission Spectroscopy at Very High Spatial and Spectral Resolution

Friday, October 29, 1999, 9:00 am, Room 6A

Session: New or Improved Surface Related Analytical Techniques
Presenter: B.P. Tonner, University of Central Florida
Authors: B.P. Tonner, University of Central Florida
R. Kneedler, University of Central Florida
K. Pecher, California Institute of Technology
T. Warwick, Lawrence Berkeley National Laboratory
Correspondent: Click to Email
Soft x-ray undulator synchrotron radiation has resulted in dramatic improvements in the performance of x-ray photoemission spectroscopy (XPS)for the study of surfaces and shallow interfaces. The two main areas of improvement are in spatial resolution and spectral resolution, which, in combination, result in improved sensitivity of the technique. Recent work with complex surfaces, such as the surfaces of natural minerals, will be used to show that fundamental issues regarding surface composition of such materials can be resolved using XPS imaging and spectroscopy from sub-micron areas. XPS microscopy is used to qualify surfaces for further analysis using high resolution photoelectron diffraction (XPD). XPD studies of large unit cell surfaces, and of mineral surfaces, will be selected to illustrate the precision of atomic geometry that can be determined. Examples will be drawn primarily from our work on copper sulfide, bixbyite, galena, and pyrite surfaces.