AVS 46th International Symposium
    Plasma Science and Technology Division Thursday Sessions
       Session PS2-ThA

Paper PS2-ThA8
Time-Resolved Optical Measurements of a Pulsed Inductively Coupled Plasma

Thursday, October 28, 1999, 4:20 pm, Room 609

Session: Pulsed Plasmas
Presenter: E.C. Benck, National Institute of Standards and Technology
Authors: E.C. Benck, National Institute of Standards and Technology
M. Edamura, National Institute of Standards and Technology
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Pulsed high density plasma sources have been suggested as an additional technique to alter plasma properties to help improve plasma etching. Time-resolved diode laser absorption spectroscopy has been used to measure the argon metastable densities in pulsed inductively coupled plasmas. These measurements were made in an inductively coupled version of the Gaseous Electronics Conference rf reference cell with Ar, Ar/O@sub 2@ and Ar/CF@sub 4@ discharges. These results are compared with time-resolved optical emission measurements from excited states of Ar, O and F atoms as well with time-resolved Langmuir probe measurements. Particular emphasis will be placed on the plasma behavior immediately after the turn on of the rf power to the coil and during the capacitive to inductive mode transition.