AVS 46th International Symposium
    Plasma Science and Technology Division Monday Sessions
       Session PS-MoP

Paper PS-MoP22
Influence of Electode-size and Finite Rise Time Effects on Plasma Sheath Expansion

Monday, October 25, 1999, 5:30 pm, Room 4C

Session: Poster Session
Presenter: G.-H. Kim, Hanyang University, Korea
Authors: G.-H. Kim, Hanyang University, Korea
H.-S. Uhm, Ajou University, Korea
S.-Y. Rhee, Hanyang University, Korea
Y.-W. Kim, Hanyang University, Korea
S.-H. Han, KIST, Korea
M.-P. Hong, Samsung Electronics, Korea
Correspondent: Click to Email
Influence of the electrode-size effects on plasma sheath expansion is investigated for a negative voltage (Vo) at the thin, flat, conducting, circular disk of radius (R). Properties of the ion sheath expansion in plasma are also investigated for a target voltage with a finite rise time. Results show that the sheath expansion is proportional to the square root of time at the beginning and is proportional to the five-sixth power of time later on. The propagation of the sheath front is proportional to the one-third power of the combination, 2VoR/pi. Experimental measurements have been carried out and the measured data are compared with the newly developed theoretical results. Those results agree remarkably well.