| AVS 45th International Symposium | |
| Vacuum Metallurgy Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | VM-MoA1 Low Temperature Growth of Protective Coatings in an ECR Plasma C.-T. Lin, F. Li, T.D. Mantei, University of Cincinnati |
| 2:20pm | VM-MoA2 Low Temperature Polycrystalline Silicon Resistors on Glass Substrates A.T. Krishnan, S.H. Bae, S.J. Fonash, Pennsylvania State University |
| 2:40pm | VM-MoA3 Closed Loop Control of Reactive Sputtering of Oxide Thin Films L. Lou, M. Mai, G.W. McDonough, H.V. Walde, R. Scholl, G.A. Roche, Advanced Energy |
| 3:00pm | VM-MoA4 Unbalanced Magnetron Sputtered Composite Metal-DLC Coatings X.T. Zeng, Gintic Institute of Manufacturing Technology, Singapore |
| 3:20pm | VM-MoA5 Invited Paper Overview of Plasma Source Ion Implantation J.R. Conrad, University of Wisconsin, Madison |
| 4:00pm | VM-MoA7 Improvement of Tribological Properties of Pure Aluminium by Isotropic ECR Ion Implantation D. Popovici, B. Terreault, A. Sarkissian, B.L. Stansfield, R.W. Paynter, G.G. Ross, INRS-Energie et Materiaux, Canada |
| 4:20pm | VM-MoA8 Molecular Dynamics Study of Al PVD Processes U.P. Hansen, P. Vogl, Technical University Munich, Germany, A. Kersch, Siemens Ag, Germany |
| 4:40pm | VM-MoA9 An XPS Study of the Effects of Chemical Pre-Cleaning of Aluminum Alloys on the Anti-Corrosion Properties of Plasma Deposited Films C.E. Moffitt, D.M. Wieliczka, University of Missouri, Kansas City, H.K. Yasuda, University of Missouri, Columbia |