AVS 45th International Symposium
    Vacuum Metallurgy Division Monday Sessions
       Session VM-MoA

Paper VM-MoA3
Closed Loop Control of Reactive Sputtering of Oxide Thin Films

Monday, November 2, 1998, 2:40 pm, Room 328

Session: Plasma Assisted Surface Treatments and Coatings
Presenter: L. Lou, Advanced Energy
Authors: L. Lou, Advanced Energy
M. Mai, Advanced Energy
G.W. McDonough, Advanced Energy
H.V. Walde, Advanced Energy
R. Scholl, Advanced Energy
G.A. Roche, Advanced Energy
Correspondent: Click to Email
Rapid closed loop control of oxygen flow was used to prevent target poisoning and facilitate high growth rate during reactive sputtering. Low frequency AC reactive sputtering of Al@sub 2@ O@sub 3@ and SiO@sub 2@ was performed achieving stable film formation with high deposition rates. Thin film properties of rate, refractive index and stress are reported as a function of pressure and power. Results are compared to reactive sputtering of these films by other techniques.