| AVS 45th International Symposium | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS1-TuM1 Simulation of a Pulsed-Power Inductively Coupled Chlorine Plasma V. Midha, D.J. Economou, University of Houston |
| 8:40am | PS1-TuM2 Fluorocarbon Film Composition and Reactor Effluent from Pulsed PECVD of Difluoromethane, 1,1,2,2-Tetrafluoroethane, and Hexafluoropropylene Oxide C.B. Labelle, K.K. Gleason, Massachusetts Institute of Technology |
| 9:00am | PS1-TuM3 Surface Composition and Reactivities of Fluorocarbon Radicals from Pulsed Fluorocarbon Plasmas N.M. Mackie, Colorado State University, J. Bard, Butler University, N.E. Capps, E.R. Fisher, Colorado State University |
| 9:20am | PS1-TuM4 Pitting-Free Gate Etching by Lowering Bias Frequency in Pulsed ECR Plasma with a Divergent Magnetic Field H. Morioka, A. Hasegawa, D. Matsunaga, N. Abe, Fujitsu Ltd., Japan |
| 9:40am | PS1-TuM5 Pulse-Power Hollow Cathode A. Belkind, J. Cai, Stevens Institute of Technology, R. Scholl, Advanced Energy Industries |
| 10:00am | PS1-TuM6 Diagnostics of Pulsed Plasmas, and the Use of Pulsed Plasmas as a Diagnostic Tool M.V. Malyshev, V.M. Donnelly, Bell Laboratories, Lucent Technologies |
| 10:20am | PS1-TuM7 Invited Paper Pulsed Plasma Processing with Helicons C. Charles, Australian National University |
| 11:00am | PS1-TuM9 Very High Density Helicon Mode Operation in WOMBAT R.W. Boswell, A. Degeling, Australian National University |
| 11:20am | PS1-TuM10 Invited Paper An Overview of Ion-Ion Plasmas for Semiconductor Processing@footnote 1@ L.J. Overzet, University of Texas, Dallas, D.J. Economou, University of Houston, J.L. Kleber, S.K. Kanakasabapathy, University of Texas, Dallas, B.A. Smith, Texas Instruments Inc. |