AVS 45th International Symposium
    Plasma Science and Technology Division Thursday Sessions
       Session PS-ThP

Paper PS-ThP14
Determination of Gas Phase Species Concentrations in High Density Plasmas for Dielectric Deposition

Thursday, November 5, 1998, 5:30 pm, Room Hall A

Session: Plasma Science and Technology Division Poster Session
Presenter: M.L. Jezl, University of Wisconsin, Madison
Authors: M.L. Jezl, University of Wisconsin, Madison
R.C. Woods, University of Wisconsin, Madison
Correspondent: Click to Email
Simultaneous application of various gas-phase spectroscopic techniques are used in order to determine the species present in a 2.45 GHz electron cyclotron resonance (ECR) reactor. The plasmas investigated are primarily silicon dioxide and fluorinated silicon dioxide deposition plasmas (SiH@sub 4@/SiF@sub 4@/TEOS + O@sub 2@). For these plasmas we are able to determine absolute concentrations of many of the important species present, while relative concentrations can be determined for many more. Among the techniques utilized are microwave spectroscopy (which can detect species densities as low as 10@super 9@ cm@super -3@), Fourier transform infrared (FTIR) spectroscopy, and silicon atomic absorption spectroscopy. Microwave and FTIR spectroscopy have demonstrated their ability to detect highly complimentary subsets of detectable molecular species. This has greatly expanded the range of species that can be monitored concurrently. In addition to determining absolute and relative concentrations of gas-phase species, we attempt to correlate the observed trends of their concentrations with the resulting film properties such as thickness, refractive index, infrared absorption, and wet etch rate. Molecules monitored include CO, CO@sub 2@, H@sub 2@O, HF, SiH@sub 4@, SiF@sub 4@, SiF@sub 2@, TEOS, H@sub2@CO, C@sub 2@H@sub 5@OH, and other TEOS decomposition products. @FootnoteText@ This work was supported by the NSF under Grant no. EEC-8721545.