AVS 45th International Symposium
    Plasma Science and Technology Division Thursday Sessions
       Session PS-ThP

Paper PS-ThP12
The Application of Helicon Antennas as a Secondary Plasma Source for Ionized PVD

Thursday, November 5, 1998, 5:30 pm, Room Hall A

Session: Plasma Science and Technology Division Poster Session
Presenter: D.B. Hayden, University of Illinois, Urbana
Authors: D.B. Hayden, University of Illinois, Urbana
D.N. Ruzic, University of Illinois, Urbana
D.R. Juliano, University of Illinois, Urbana
M.M.C. Allain, University of Illinois, Urbana
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Ionized PVD may extend the usefulness of PVD for several generations by allowing the directional fill of higher aspect-ratio features. Previous work typically has used an inductively coupled plasma (ICP) coil of various designs to drive a high-density plasma in between the sputter target and substrate. A different approach using a helicon antenna to drive the high-density plasma instead is discussed. Helicon-produced plasmas are renowned for their high coupling efficiency given modest input powers. This remotely located source (external to the sputter chamber) has distinct advantages over an immersed ICP coil by eliminating shadowing and flaking problems. Helicon plasmas also have higher maximum achievable densities, thus yielding a higher ionization fraction than ICP coil-driven plasmas. Data for one external source (with various antennas including the helical and Nagoya type III) are shown. The surrounding electromagnets needed for igniting and sustaining the helicon plasma are variable up to 1.5 kG. Pressures investigated are 5-50 mTorr. The effects of multiple antennas surrounding the chamber, which would improve uniformity and density considerably, are discussed.