AVS 45th International Symposium
    Nanometer-scale Science and Technology Division Wednesday Sessions
       Session NS+AS-WeM

Paper NS+AS-WeM7
Nano-scale Observations of Stress-Enhanced Dissolution in Monoclinic CaHPO@sub4@ 2H@sub 2@O: Chemical vs. Mechanical Effects

Wednesday, November 4, 1998, 10:20 am, Room 321/322/323

Session: Innovative Force, Near-Field Optics, and Tunneling Measurements
Presenter: S.C. Langford, Washington State University
Authors: S.C. Langford, Washington State University
L. Scudiero, Washington State University
J.T. Dickinson, Washington State University
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In several mechanical wear situations, e.g., biomaterials in hip replacements and mechanochemical polishing (used extensively in the microlectronics industry), a surface experiences simultaneous tribological loading and corrosive chemical exposure. The combination can greatly increase wear rates. We examine single crystal brushite [CaHPO@sub 4@ 2H@sub 2@O] (a model biomaterial) in buffered aqueous solutions mechanically stimulated by the tip of a Scanning Force Microscope (SFM). Quantitative data on nanometer-scale wear of single atomic layer steps are readily obtained. The (010) faces of this material are strongly anisotropic, forming trianglular etch pits bounded by three crystallographically distinct steps in aqueous solution. Stress-enhanced dissolution is readily observed along all three steps. On each step, the wear rate is a highly nonlinear (essentially exponential) function of contact force; this function dependence is modeled in terms of stress-enhanced double kink nucleation. At low contact forces, etch pit growth principally involves dissolution along [210] steps; in contrast, the [101] steps are far more vulnerable to wear at high contact forces than the other steps. Damaged regions along [101] steps are especially vulnerable to subsequent chemical dissolution. We exploit this effect to produce atomically flat surfaces many microns in dimension. We also describe the influence of tip velocity and solution chemistry on the rates of corrosive wear. This highly anisotropic material provides a useful system for isolating aspects of the crystal structure which render it vulnerable to chemical etching from those which make it vulnerable to mechanical damage. This work is supported in part by a grant from the National Science Foundation, Grant CMS-9414405.