Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2016)
    Thin Films Wednesday Sessions

Session TF-WeM
Plasma-based Film Growth, Etching, & Processing

Wednesday, December 14, 2016, 8:00 am, Room Makai
Moderator: Davide Sangiovanni, Linköping University, Sweden


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF-WeM1
Flexible Electrochromic Electrodes on the Substrate of Crystalline Indium Tin Oxide with Graphene
Yekyung Kim, SJ. Lee, JW. Seo, S.H. Han, H. Kim, Korea Electronics Technology Institute (KETI), Republic of Korea
8:20am TF-WeM2
Maximizing Retention of Complex Chemical Functionality in Plasma Polymers Via the Alpha-Gamma Transition
Andrew Michelmore, S. Saboohi, B.R. Coad, University of South Australia, Australia, R.D. Short, University of Lancaster, UK, H.J. Griesser, University of South Australia, Australia
8:40am TF-WeM3 Invited Paper
Layer-by-layer Etching of LaAlSiOx
Mitsuhiro Omura, K. Furumoto, K. Matsuda, T. Sasaki, I. Sakai, H. Hayashi, Toshiba Corporation, Japan
9:20am TF-WeM5
Effect of Ar+ Ion Assist on the Properties of a-C:H Films Deposited on a Trench
J. Choi, The University of Tokyo, Japan, Yuki Hirata, Tokyo University of Science, The University of Tokyo, Japan, K. Onishi, The University of of Tokyo, Japan, S. Sasaki, Tokyo University of Science, Japan
9:40am TF-WeM6
Characterization of PECVD a-C:H:Si:O:Cl Films
D. Rossi, UNESP - Sorocaba, Brazil, R. Landers, Ifgw - Unicamp, Brazil, J.R. Bortoleto, Steven Durrant, UNESP - Sorocaba, Brazil
10:20am TF-WeM8 Invited Paper
Plasma-assisted Atomic Layer Deposition of SiNx Films
R.A. Ovanesyan, N. Leick, R.J. Gasvoda, J.M. Klein, Colorado School of Mines, USA, D.M. Hausmann, Lam Research Corporation, USA, Sumit Agarwal, Colorado School of Mines, USA
11:00am TF-WeM10
Atomic Scale Analyses of Plasma Surface Reactions using Molecular Dynamics Simulations and Ion/radical Beam Experiments
Satoshi Hamaguchi, H. Li, T. Ito, M. Isobe, K. Karahashi, Osaka University, Japan
11:20am TF-WeM11
Low-temperature Fabrication of Amorphous Zinc Tin Oxide Thin Film Transistors without Annealing Process
Sungmin Kim, J.M. Kim, H.J. Kim, Seoul National University, Korea, Republic of Korea