Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2014) | |
Thin Films | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
TF-WeP1 Inductively Coupled Ar-Based Plasma Etching of Palladium for Low Damage in Underlying GaN Semiconductor Yong-Yeon Kim, J.K. Kim, J.M. Lee, Sunchon National University, Republic of Korea |
TF-WeP2 Effect of Copper Layer Thickness on the Thermal Performance of LED Ceramic Package Substrate HyunMin Cho, S. Jang, S. Ha, KETI, Republic of Korea |
TF-WeP3 Characteristics of Al, Ag, and Cu Metal Mesh Prepared by Photolithography for Touch Screen Panels M.J. Kim, Pungkeun Song, S.H. Cho, Pusan National University, Republic of Korea |
TF-WeP4 Improved Initial Growth Behavior of Atomic Layer Deposited SrTiO3 Films with [Sr(demamp)(tmhd)]2 as Sr-precursor Woongkyu Lee, W. Jeon, Y.W. Yoo, C.H. An, M.J. Chung, Seoul National University, Republic of Korea, T.-M. Chung, B.K. Park, S.M. George, C.G. Kim, Korea Research Institute of Chemical Technology, C.S. Hwang, Seoul National University, Republic of Korea |
TF-WeP5 Nanoscale Wrinkle Structures on Polydimethylsiloxane using Ion-Beam Bombardment JuHwan Lee, H.-G. Park, H.-C. Jeong, Y.H. Jung, D.-S. Seo, Yonsei University, Republic of Korea |
TF-WeP6 Molecular Arrangements and Electronic States of Well-Defined K-Doped Coronene and Picene Monolayers Masahiro Yano, M. Endo, R. Shimizu, Y. Hasegawa, Y. Yamada, M. Sasaki, University of Tsukuba, Japan |
TF-WeP7 Failure Behaviors of Stretchable Electrodes Based on Metal Nanostructure Percolation Networks Guh-Hwan Lim, H. Sim, B. Lim, Sungkyunkwan University, Korea, Republic of Korea |
TF-WeP8 Properties of Photo-Induced Hybrid Channel Thin-Film Transistors Via Solution Process YoonHo Jung, H.-G. Park, H.-C. Jeong, D.-S. Seo, Yonsei University, Republic of Korea |
TF-WeP9 Uniform Alignment of Liquid Crystal Molecules on Solution-Based Oxide Films Hae-Chang Jeong, H.-G. Park, D.-S. Seo, Yonsei University, Republic of Korea |
TF-WeP10 Fabrication of SiC based AFM Cantilever for NSOM Application S.-H. Nam, K.-H. Hwang, J.H. Yu, Jinsu Lee, J.-H. Boo, Sungkyunkwan University, Republic of Korea |
TF-WeP11 Reliability and Life Time Flexible OLED Device Fabricated on ITO/Ag NW/ITO Thin Film on PES Substrate WooJin Yeon, Y.T. Oh, K.H. Kim, E.S. Kim, DongChan. Shin, Chosun University, Republic of Korea |
TF-WeP12 A Study of the Mechanical Properties of Trench Type Cu/Mo Thin Films for Flexible Copper Interconnect JongHyun Seo, Korea Aerospace University, Republic of Korea, H.-S. Kim, Korea Aerospace University, HH. Choe, J.-H. Jeon, J.H. Yoon, Korea Aerospace University, Republic of Korea |
TF-WeP14 Computational Simulation Study on Structure Change of Si-DLC Films Takeshi Tsuruda, H. Murabayashi, Y. Wang, Y. Kobayashi, T. Kuwahara, S. Bai, Y. Higuchi, N. Ozawa, K. Adachi, Tohoku University, Japan, J.M. Martin, Ecole Centrale de Lyon, France, M. Kubo, Tohoku University, Japan |
TF-WeP15 Tight-Binding Quantum Chemical Molecular Dynamics Simulation on Chemical Reaction of Molybdenum Dithiocarbamate on DLC surface Hiroki Murabayashi, T. Tsuruda, Y. Wang, Y. Kobayashi, S. Bai, Y. Higuchi, N. Ozawa, K. Adachi, Tohoku University, Japan, J.M. Martin, Ecole Centrale de Lyon, France, M. Kubo, Tohoku University, Japan |
TF-WeP20 Lifetime Calculation of Encapsulated Oganic Device Under Specific Weather Conditions Namsu Kim, Korea Electronics Technology Institute (KETI), Republic of Korea, D. Kim, Korea Electronics Technology Institute (KETI), K. Hwang, University of California at San Diego, S. Graham, Georgia Institute of Technology, S. Kim, Korea Electronics Technology Institute (KETI) |
TF-WeP22 Spin Valve Junctions Based on Fe3Si/FeSi2/Fe3Si Trilayered Films Tsuyoshi Yoshitake, Kyushu University, Japan, K. Sakai, Kurume National College of Technology, Japan, Y. Asai, K. Ishibashi, Y. Noda, Kyushu University, Japan, K. Takeda, Fukuoka Institute of Technology |
TF-WeP23 Application of Double-Lorentzian Line-Shape in XPS Analysis of Metallic Zn and ZnO Thin Films. Gabriela Molar-Velazquez, G. Gomez-Sosa, A. Herrera-Gomez, CINVESTAV-Unidad Queretaro, Mexico |
TF-WeP25 Double-Lorentzian Line Shape in XPS Analysis of Metallic Nickel, Chromium, Cobalt and Their Oxide Films Gustavo Gomez-Sosa, J.A. Torres-Ochoa, M. Bravo-Sanchez, J.H. Mata-Salazar, D. Cabrera- German, J. Ibarra-Nuno, A. Herrera-Gomez, CINVESTAV-Unidad Queretaro, Mexico |
TF-WeP26 Improved Adhesion of Diamond-Like Carbon Films by r.f. Plasma CVD Process with Cylindrical Electrode Keisuke Shiba, Tokyo Denki University, Japan, Y. Ohgoe, Tokyo Denki University, M. Hiratsuka, Nanotec Corporation, K. Ozeki, Ibaraki University, K. Hirakuri, K. Sato, Tokyo Denki University, Japan |
TF-WeP28 Inductively Coupled Plasma Reactive Ion Etching of CoFeB Thin Films Using a CH3COOH/Ar Gas Mixture Adrian Garay, S.M. Hwang, J.H. Choi, C.W. Chung, Inha University, Korea |
TF-WeP29 Electronic Transmission of Two, Three and Four Magneto-Electrostatic Barriers on Graphene: An Approach to Diode, Transistor and Thyristor. R.A. Reyes Villagrana, Jesús Madrigal Melchor, J.R. Suárez López, I. Rodríguez Vargas, Universidad Autónoma de Zacatecas, México |
TF-WeP32 Influence of Deposition Conditions on the Structural and Optical Properties of nc-Si/SiO2 Films in SiOx Matrix using HW-CVD Ateet Dutt, Matsumoto, Centro de Investigación y de Estudios Avanzados del IPN, Mexico, Santana-Rodríguez, Universidad Nacional Autónoma de México, Mexico, Santoyo Salazar, Godavarthi, Centro de Investigación y de Estudios Avanzados del IPN, Mexico |
TF-WeP34 Chemically Enhanced Raman Scattering of Rhodamine 6 G Molecule Adhere to Graphene, MoS2 and WSe2: Efficiency Variation determined by Pressure and Charge Transfer Hyunmin Kim, Daegu Gyeongbuk Institute of Science and Technology, Korea, Y. Lee, Sungkyunkwan University, Korea, S.M. Jeong, Daegu Gyeongbuk Institute of Science and Technology, Korea, J.H. Cho, Sungkyunkwan University, Korea, J.-H. Ahn, Yonsei University, Korea |
TF-WeP36 Negative Thermal Expansion of Polystyrene Ultrathin Films Supported on Si Substrates revealed by X-Ray Reflectivity: Quench Rate Dependence Kazuki Nishimori, S. Nakahara, K. Sekiya, Kwansei Gakuin University, Japan, Y. Chunming, Shanghai Institute of Applied Physics, China, I. Takahashi, Kwansei Gakuin University, Japan |
TF-WeP37 Large-Scale Laser Scribing of Complex Motifs Goran Rasic, North Carolina Central University |
TF-WeP38 Probing Ni(111)-graphene interface using Raman spectroscopy Guanjun Cheng, I. Calizo, A.R. Hight-Walker, National Institute of Standards and Technology |
TF-WeP40 High Temperature Self-Lubricant Coatings with Release of a Lubricious Agent for Machining Applications F. Fernandes, University of Coimbra, Portugal, T. Polcar, University of Southampton, UK, Albano Cavaleiro, University of Coimbra, Portugal |