Paper TF+SE-ThM1
In Situ Synchrotron Characterization Techniques Enabled Nanostructured Materials using ALD

Thursday, November 2, 2017, 8:00 am, Room 20

To achieve the goal of rational design of next generation of advanced materials, we have been working on developing atomic layer deposition (ALD) as a promising method to tailor size and composition of nanostructured materials for a wide range of applications. Benefiting from self-limiting surface reactions, ALD enables conformal coatings of materials on three-dimensional substrates. The atomic level control of depositions makes it attractive to precisely synthesize the size and composition of nanomaterials. The size and composition of nanomaterials play important roles in achieving high performance in many applications. In this talk, we will discuss nanomaterials synthesized using Pd ALD and their applications in catalysis and energy storage. We will also illustrate that in situ characterization techniques such as synchrotron X-ray based X-ray absorption spectroscopy (XAS), X-ray pair distribution function (PDF), and FT-IR significantly advance our understandings of ALD in terms of surface chemistry and surface dynamics.