| AVS 64th International Symposium & Exhibition | |
| Novel Trends in Synchrotron and FEL-Based Analysis Focus Topic | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | SA+AS+HC+SS-WeA1 Invited Paper Probing Solid-Gas and Solid-Liquid Interface Using APXPS Zhi Liu, J. Cai, Q. Liu, ShanghaiTech University, PR China, Y. Han, Chinese Academy of Sciences, PR China, J. Liu, ShanghaiTech University, PR China, M. Mao, H. Zhang, Chinese Academy of Sciences, PR China, Y. Li, ShanghaiTech University, PR China |
| 3:00pm | SA+AS+HC+SS-WeA3 Graphene Capped Static and Fluidic Systems for In-Liquid Atmospheric Pressure XPS/AES/SEM and PEEM Studies of Electrochemical Interfaces Hongxuan Guo, E. Strelcov, A. Yulaev, NIST, Center for Nanoscale Science and Technology, S. Nemšák, D.N. Mueller, C.M. Schneider, Peter Grünberg Institute and Institute for Advanced Simulation, Germany, A. Kolmakov, NIST, Center for Nanoscale Science and Technology |
| 3:20pm | SA+AS+HC+SS-WeA4 A 3D Printed Liquid Cell for Soft X-ray Absorption Spectroscopy Tom Regier, T.D. Boyko, J. Dynes, Z.N. Arthur, Canadian Light Source, Inc., M.N. Banis, University of Western Ontario, Canada |
| 4:20pm | SA+AS+HC+SS-WeA7 Invited Paper In Operando Quantification of Valence Changes in Memristive Devices R. Dittmann, Christoph Baeumer, Peter Gruenberg Institute, Forschungszentrum Juelich GmbH, Juelich, Germany, D. Cooper, Université Grenoble Alpes & CEA, LETI, Minatec Campus, Grenoble, France, C. Schmitz, S. Menzel, C.M. Schneider, R. Waser, Peter Gruenberg Institute, Forschungszentrum Juelich GmbH, Juelich, Germany |
| 5:00pm | SA+AS+HC+SS-WeA9 Invited Paper Magnetic Skyrmions in Ultrathin Magnetic Films and Nanostructures Jan Vogel, Institut Néel, CNRS/UGA, Grenoble, France, O. Boulle, R. Juge, SPINTEC, CNRS/CEA/UGA, Grenoble, France, D.S. Chaves, S. Pizzini, Institut Néel, CNRS/UGA, Grenoble, France, S.G. Je, G. Gaudin, SPINTEC, CNRS/CEA/UGA, Grenoble, France, T.O. Mentes, A. Locatelli, Elettra-Sincrotrone Trieste, Italy, M.U.J. Foerster, L. Aballe, ALBA Synchrotron Light Facility, Spain |
| 5:40pm | SA+AS+HC+SS-WeA11 O2 Pressure Dependence of SiO2/Si Interfacial Oxidation Rate Studied by Real-time Photoelectron Spectroscopy Shuichi Ogawa, Tohoku University, Japan, A. Yoshigoe, JAEA, Japan, S. Ishidzuka, National Institute for of Technology, Akita College, Japan, Y. Takakuwa, Tohoku University, Japan |
| 6:00pm | SA+AS+HC+SS-WeA12 Highly Time-resolved Insights into the Sputter Deposition of Metal Electrodes on Polymer Thin Films for Organic Electronics Franziska Löhrer, V. Körstgens, Technische Universität München, Germany, M. Schwartzkopf, Deutsches Elektronensynchrotron DESY, Germany, A. Hinz, O. Polonskyi, T. Strunskus, F. Faupel, Christian-Albrechts-Universität zu Kiel, Germany, S.V. Roth, Deutsches Elektronensynchrotron DESY, Germany, P. Müller-Buschbaum, Technische Universität München, Germany |